Description
Specifications Table
Product Material – Chemical solution blend
Grade – Laboratory grade
Application – Developer residue removal, photochemical processing
Product Overview
Photo Developer Stripper is a specialized chemical solution designed for efficient removal of photoresist and developer residues in laboratory settings. Formulated with high-purity components, it ensures thorough cleaning without damaging sensitive substrates or equipment. The solution maintains consistent performance across repeated applications, making it ideal for routine photochemical processes. Its balanced pH and non-corrosive properties enhance safety while delivering reliable results. The product is compatible with most standard lab glassware and plasticware, reducing the risk of cross-contamination. Proper storage in a cool, dry environment preserves its efficacy over extended periods. Whether used in educational labs or research facilities, this stripper provides a cost-effective solution for maintaining clean, residue-free surfaces essential for accurate experimental outcomes.
FAQs
1. What is the shelf life of this Photo Developer Stripper?
When stored in a tightly sealed container away from direct sunlight, the product maintains optimal performance for up to 24 months from the date of manufacture.
2. Can this stripper be used with plastic labware?
Yes, it is compatible with most common laboratory plastics like polypropylene and polyethylene, though prolonged exposure should be avoided to prevent potential degradation.
3. What safety precautions should be taken while handling?
Always wear nitrile gloves, safety goggles, and work in a well-ventilated area or under a fume hood to avoid skin contact and inhalation of fumes.
4. How should I dispose of used Photo Developer Stripper?
Neutralize the solution according to standard lab protocols before disposal, following local environmental regulations for chemical waste management.
5. Is this product suitable for removing old photoresist layers?
While primarily designed for developer residue removal, it can effectively soften and assist in the removal of aged photoresist when combined with gentle mechanical agitation.
