Description
Specifications Table
Product Name – Lanthanum(III) nitride, 99.9% (REO)
Quantity/Pack Size – 25g, 5g
Form – Crystalline powder
Grade – 99.9% (REO)
Application – Catalysis, semiconductor doping, ceramic synthesis
Product Overview
Lanthanum(III) nitride (LaN) with 99.9% rare-earth oxide (REO) purity represents a high-performance ceramic material characterized by its exceptional thermal stability and unique electronic properties. This crystalline powder form ensures uniform reactivity in specialized applications where rare-earth nitrides serve as critical components. The material’s high purity level minimizes impurities that could compromise performance in sensitive reactions, making it particularly valuable for processes requiring precise stoichiometric control. Its refractory nature allows for stable operation at elevated temperatures, while the nitride structure contributes to distinctive optical and electrical behaviors. The product is synthesized under controlled conditions to maintain consistent particle size distribution and phase purity, ensuring reproducibility in experimental setups. As a member of the lanthanide nitride family, this compound exhibits properties that bridge the gap between traditional ceramics and advanced functional materials, offering researchers a versatile platform for exploring novel material systems.
FAQs
1. What is the chemical formula and structure of this lanthanum nitride?
The product corresponds to LaN, featuring a cubic crystal structure typical of rare-earth mononitrides where lanthanum atoms are coordinated with nitrogen in a rock-salt arrangement.
2. How does the 99.9% REO purity specification translate to actual composition?
The 99.9% REO designation indicates that when converted to oxide form, the lanthanum content meets this purity threshold, with trace impurities primarily consisting of other rare earth elements and oxygen.
3. What precautions should be taken when handling this powder?
As with all reactive nitrides, this material should be handled under inert atmosphere to prevent hydrolysis, using appropriate PPE including gloves and respiratory protection in well-ventilated areas.
4. Can this product be used for thin film deposition applications?
The high purity and controlled particle characteristics make it suitable as a precursor for physical vapor deposition techniques, though optimization of deposition parameters would be required.
5. What is the typical shelf life when stored properly?
When maintained in sealed containers under dry argon or nitrogen atmosphere, the material retains its specified properties for at least 12 months from the date of manufacture.
