Description
Specifications Table
Product Name – Tantalum(V) chloride, 99.99%, (trace metal basis)
Quantity/Pack Size – 5GR, 25GR, 100GR
Form – Solid (crystalline powder)
Grade – 99.99% (trace metal basis)
Application – Catalysis, semiconductor doping, inorganic synthesis
Product Overview
Tantalum(V) chloride, with a purity of 99.99% on a trace metal basis, is a highly specialized inorganic compound prized for its exceptional reactivity and minimal impurities. This crystalline powder is synthesized under stringent conditions to ensure consistency, making it ideal for demanding applications where trace metal contamination must be avoided. Its high purity level guarantees reliable performance in sensitive reactions, particularly in catalysis and semiconductor fabrication. The compound is hygroscopic, requiring careful handling and storage under inert conditions to prevent hydrolysis. Its strong Lewis acidity and ability to form stable complexes make it a versatile reagent in inorganic and organometallic chemistry. The product is rigorously tested for metal impurities, ensuring compliance with high-end research standards. Its stability under controlled conditions and predictable behavior in synthesis protocols make it a preferred choice for advanced laboratory work.
FAQs
1. What is the shelf life of Tantalum(V) chloride if stored properly?
When stored in an airtight container under inert gas, the product remains stable for up to 24 months from the date of manufacture.
2. Is this compound compatible with standard glassware?
Yes, but prolonged exposure to moisture or air can cause corrosion. Use dry, inert conditions and consider PTFE-lined containers for long-term storage.
3. Are there lower-purity alternatives available for general applications?
Lower grades (99% or 99.5%) exist but may contain higher trace metal impurities, affecting reaction outcomes in sensitive processes.
4. How should I dispose of unused Tantalum(V) chloride?
Neutralize with a dilute base under controlled conditions, then follow local hazardous waste disposal regulations for metal halides.
5. Can this be used in vapor deposition processes?
Yes, its high purity and volatility make it suitable for chemical vapor deposition (CVD) applications in semiconductor manufacturing.
