Description

Specifications Table

Product Name – Tellurium, 99.999%, (trace metal basis), powder
Quantity/Pack Size – 25GR, 100GR
Form – Powder
Grade – 99.999% (trace metal basis)
Application – Semiconductor, alloying, and analytical research

Product Overview

This high-purity 99.999% Tellurium powder (trace metal basis) is engineered for demanding laboratory and industrial applications where trace impurities can compromise results. The fine powder form ensures uniform dispersion and rapid reaction kinetics, making it ideal for semiconductor doping, thermoelectric materials, and specialized alloy formulations. Sourced from premium-grade raw materials, this Tellurium undergoes rigorous purification to eliminate metallic contaminants, delivering consistent batch-to-batch performance. Its trace metal basis certification guarantees minimal interference in sensitive analytical procedures, while the controlled particle size distribution enhances solubility and reactivity. Whether used in thin-film deposition, chemical synthesis, or as a reagent in advanced materials research, this Tellurium powder maintains exceptional purity levels to support high-precision workflows. The product is packaged under inert conditions to prevent oxidation, ensuring long-term stability and reliability in critical applications.

FAQs

1. What is the particle size range of this Tellurium powder?

The powder typically features a fine particle size distribution optimized for uniform mixing and reaction efficiency, though exact micron specifications may vary by batch.

2. Is this Tellurium powder compatible with vacuum deposition processes?

Yes, the high purity and low moisture content make it suitable for physical vapor deposition (PVD) and other vacuum-based thin-film applications.

3. Are there lower-purity alternatives available for less critical applications?

For applications where ultra-high purity isn’t required, 99.9% or 99.5% Tellurium grades may be more cost-effective while still meeting general lab standards.