Description
Specifications Table
Product Name – Ammonium hexafluorosilicate, PuratrOnic™, 99.999% (metals basis) Quantity/Pack Size – 250g, 50g, 10g Form – Crystalline solid Grade – PuratrOnic™ (99.999% metals basis) Application – Semiconductor etching, glass processing, high-purity synthesis
Product Overview
This PuratrOnic™ grade ammonium hexafluorosilicate delivers exceptional 99.999% purity on a metals basis, making it one of the most refined options available for demanding laboratory applications. The crystalline solid form ensures consistent composition and easy handling in controlled environments. Its ultra-low trace metal content (typically <1 ppm for most metallic impurities) eliminates interference in sensitive analytical procedures and advanced material synthesis. The compound's high fluorine content and silicon coordination provide unique reactivity profiles that are critical for specialized chemical processes. Each batch undergoes rigorous quality control to maintain the stated purity level, with certification documentation available upon request. The material is packaged in high-density polyethylene containers to prevent contamination during storage and handling. While primarily used in semiconductor manufacturing and glass processing, its extreme purity also makes it suitable for calibration standards and research-grade chemical formulations. The product's stability under normal laboratory conditions ensures long shelf life when stored properly in a cool, dry environment.
FAQs
1. What is the difference between PuratrOnic™ grade and standard reagent grade?
PuratrOnic™ grade represents the highest purity level we offer, with 99.999% metals basis purity compared to standard reagent grade which typically ranges between 96-99%. The PuratrOnic™ version undergoes additional purification steps to remove trace metals and other impurities that could interfere with sensitive applications.
2. Can this product be used for semiconductor etching applications?
Yes, the high purity and consistent composition make it particularly suitable for semiconductor etching processes where even trace contaminants could affect performance. The fluorine content provides the necessary etching capability while the low metal content prevents unwanted doping or contamination of semiconductor materials.
3. What precautions should be taken when handling this chemical?
As with all fluoride compounds, proper handling procedures should be followed. Use in a well-ventilated fume hood, wear appropriate PPE including gloves and eye protection, and avoid inhalation of dust. The material should be stored away from moisture and incompatible substances like strong bases.
4. How should this product be stored for maximum shelf life?
Store in a tightly sealed original container in a cool, dry place away from direct sunlight and moisture. The crystalline form is stable under these conditions, but exposure to humidity can lead to decomposition over time. Keep the container properly labeled and separate from incompatible materials.
5. Is this product compatible with standard laboratory glassware?
While compatible with most borosilicate glassware for short-term use, prolonged contact may etch the glass due to the fluoride content. For extended procedures, we recommend using PTFE or other fluoride-resistant containers to prevent contamination and equipment damage.
