Description
Specifications Table
Product Name – Lithium niobium oxide, Puratronic™, 99.998% (metals basis excluding Ta), Ta <50ppm Quantity/Pack Size – 500g, 100g, 25g Form – Powder Grade – Puratronic™ (99.998%) Application – Optoelectronics, piezoelectric devices, nonlinear optics
Product Overview
Lithium niobium oxide (LiNbO₃) in Puratronic™ grade offers exceptional purity at 99.998% (metals basis excluding tantalum), with Ta content strictly controlled below 50ppm. This high-performance material is engineered for applications demanding superior optical, piezoelectric, and nonlinear properties. The ultra-low impurity profile ensures minimal interference in sensitive experiments, making it a preferred choice for cutting-edge research in photonics, electro-optics, and advanced ceramics. Its crystalline structure provides excellent transparency in the visible to mid-IR range, while its robust piezoelectric coefficients enable precise control in acoustic and RF devices. The powder form allows for versatile processing, including thin-film deposition, single-crystal growth, and composite material fabrication. With consistent batch-to-batch reliability, this lithium niobium oxide variant meets the stringent requirements of modern material science, where trace impurities can significantly impact performance. The material’s thermal stability and resistance to chemical corrosion further enhance its utility in high-temperature and reactive environments, ensuring long-term durability in demanding applications.
FAQs
1. What is the significance of the 99.9998% purity level in this lithium niobium oxide?
The 99.998% purity ensures minimal metallic impurities that could alter optical, electrical, or structural properties, making it suitable for high-precision applications where trace contaminants are critical.
2. How does the Ta <50ppm specification affect performance?
Tantalum levels below 50ppm prevent unwanted doping effects that could modify the material’s dielectric or piezoelectric response, ensuring consistent behavior in sensitive devices.
3. Can this material be used for thin-film applications?
Yes, the powder form is compatible with physical vapor deposition (PVD), chemical vapor deposition (CVD), and sputtering techniques for thin-film fabrication.
4. What storage conditions are recommended to maintain purity?
Store in a dry, inert atmosphere (e.g., argon or nitrogen) at room temperature to prevent moisture absorption or oxidation, which could degrade performance.
5. Is this product compatible with standard lithography processes?
Yes, its high purity and uniform particle size distribution make it suitable for photolithography and etching processes in microfabrication workflows.
