Description
Specifications Table
Product Name – Molybdenum(VI) oxide, Puratronic™, 99.998% (metals basis excluding W), W 300ppm max Quantity/Pack Size – 100g, 25g Form – Powder Grade – Puratronic™ (99.998%) Application – Catalysis, thin-film deposition, semiconductor research
Product Overview
This Puratronic™ grade Molybdenum(VI) oxide delivers exceptional 99.998% purity (metals basis excluding tungsten), with tungsten content strictly controlled below 300ppm to prevent interference in high-sensitivity applications. The ultra-low impurity profile makes it particularly suited for advanced materials research, where trace contaminants can compromise results. The fine powder form ensures homogeneous dispersion in solutions or composites, while the high metal purity supports reproducible outcomes in catalytic reactions and thin-film fabrication. Unlike standard grades, this material undergoes rigorous purification to eliminate residual tungsten—a common contaminant in molybdenum compounds—that can skew spectroscopic analysis or degrade semiconductor performance. Its consistent particle size distribution further enhances process control in lab-scale synthesis. The oxide’s thermal stability and resistance to oxidation under moderate conditions extend its utility in high-temperature applications without compromising structural integrity. For researchers requiring a reliable, high-purity molybdenum source with documented trace element limits, this Puratronic™ grade provides a benchmark for precision and repeatability in demanding experimental setups.
FAQs
1. What is the significance of the 300ppm tungsten limit in this molybdenum oxide?
The 300ppm maximum tungsten content ensures minimal interference in applications like semiconductor doping or catalysis, where tungsten can act as an unintended dopant or poison active sites. This specification is critical for experiments requiring strict control over transition metal impurities.
2. Can this Puratronic™ grade be used for sputtering targets in thin-film deposition?
Yes, the high purity and low tungsten content make it suitable for physical vapor deposition (PVD) processes, though the powder form may require pressing into a target blank before use. Ensure compatibility with your specific sputtering system’s requirements.
3. How does this compare to ACS-grade molybdenum oxide?
ACS-grade typically has lower purity (99.5–99.9%) and higher impurity levels, including tungsten. This Puratronic™ grade offers superior consistency for research applications where trace contaminants must be minimized, such as in nanotechnology or advanced catalysis.
4. What storage conditions are recommended to maintain its purity?
Store in a tightly sealed container under inert gas (argon/nitrogen) to prevent moisture absorption and oxidation. Avoid exposure to reducing agents or acidic vapors, which can degrade the oxide’s purity over time.
5. Is this product compatible with aqueous solutions for wet chemistry?
The powder dissolves in alkaline solutions but may form insoluble species in neutral or acidic media. For homogeneous solutions, pre-dissolution in diluted ammonia or sodium hydroxide is recommended, followed by filtration if particulate-free solutions are required.
