Silicon (Si) 1000 ppm Single Element Std. Soln. for ICP in HNO3 | 888740 | CDH

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Silicon (Si) 1000 ppm Single Element Std. Soln. for ICP in HNO3 | 888740 | CDH

Premium Silicon (Si) 1000 ppm standard solution for ICP analysis. Prepared in nitric acid, ensuring high purity and stability for precise analytical results. Essential for instrument calibration.

Category Brand:

9,963.00

Description

Specifications Table

Product Name – Silicon (Si) 1000 ppm Single Element Std. Soln. for ICP in HNO3

Quantity/Pack Size – 100 ml

Form – Liquid Solution

Grade – ICP Standard Grade

Application – Inductively Coupled Plasma (ICP) Analysis

Product Overview

Our Silicon (Si) 1000 ppm Single Element Standard Solution is meticulously crafted for professionals requiring unparalleled accuracy and reliability in their Inductively Coupled Plasma (ICP) analyses. This high-purity solution is precisely formulated to a concentration of 1000 parts per million (ppm) of Silicon, making it an indispensable tool for calibrating ICP-OES and ICP-MS instruments. Prepared in a stable nitric acid (HNO3) matrix, it ensures excellent stability over time and minimizes potential interferences, providing a consistent and dependable reference point for your elemental determinations. Ideal for a wide array of applications including environmental monitoring, material science research, geological studies, and industrial quality control, this standard guarantees the integrity of your analytical data. Researchers and students can depend on its certified purity for accurate quantification of silicon, a critical element across numerous scientific disciplines. The rigorous quality control measures during manufacturing ensure lot-to-lot consistency, offering peace of mind and reproducible results every time you perform an analysis. This solution is designed to support the most demanding analytical protocols, providing the foundational accuracy required for meaningful scientific discovery and precise quality assurance. Its robust formulation helps prevent precipitation and maintains elemental homogeneity, facilitating seamless integration into your laboratory workflow and instrument setup.

FAQs

1. What is the primary use of this Silicon ICP Standard Solution?

This Silicon (Si) 1000 ppm standard solution is primarily used for the calibration and verification of Inductively Coupled Plasma (ICP) instruments, including ICP-OES and ICP-MS, to accurately quantify silicon in various samples.

2. How should I store this standard solution to maintain its integrity?

For optimal stability and integrity, store the solution in its original sealed container at room temperature (15-25°C), away from direct sunlight and extreme temperature fluctuations. Ensure the cap is tightly closed after each use.

3. Is this Silicon standard compatible with other ICP-OES or ICP-MS instruments?

Yes, this Silicon (Si) 1000 ppm standard solution is formulated for broad compatibility with most commercially available ICP-OES and ICP-MS instruments. Its nitric acid matrix is commonly used and accepted by these systems.

4. What precautions should be taken when handling this solution?

Always wear appropriate personal protective equipment (PPE) such as safety glasses, gloves, and a lab coat when handling this solution. Work in a well-ventilated area or under a fume hood. Refer to the Safety Data Sheet (SDS) for detailed safety information.

5. Can this standard be diluted for lower concentration applications?

Yes, this 1000 ppm standard can be accurately diluted using high-purity deionized water and a compatible nitric acid matrix solution to achieve lower concentrations for specific calibration curves or quality control checks, ensuring precise results.

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