Description
Specifications Table
Product Name – Silicon (Si) 10000 ppm Single Element Std. Soln. for ICP in HNO3
Quantity/Pack Size – 100 ml
Form – Liquid Solution
Grade – ICP Standard, High Purity
Application – ICP-OES, ICP-MS, Trace Element Analysis, Analytical Chemistry
Product Overview
This Silicon (Si) 10000 ppm Single Element Standard Solution in HNO3 is meticulously prepared for demanding analytical applications, offering unparalleled accuracy and precision. As a crucial reference material, it ensures reliable calibration and validation for Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES) and Inductively Coupled Plasma-Mass Spectrometry (ICP-MS) analyses. Our solution provides a certified 10000 parts per million (ppm) concentration of Silicon, offering a highly stable and reliable benchmark for instrument calibration and method validation across a spectrum of matrices. The formulation utilizes a high-purity nitric acid matrix, expertly chosen to minimize interferences and guarantee clean, consistent results even with complex sample types. This controlled matrix environment is critical for preventing matrix effects that can compromise analytical accuracy.
Developed to meet stringent international quality control standards, this standard is indispensable for laboratories engaged in precise trace element analysis, environmental monitoring, advanced material science research, and rigorous quality assurance in various industrial processes. Scientists and researchers can depend on its certified concentration and exceptional purity to achieve reproducible data, maintain the integrity of their analytical findings, and ensure compliance with regulatory requirements. This solution facilitates accurate quantification of Silicon, a vital element with significant applications across fields ranging from geology and geochemistry to semiconductor manufacturing and biological studies. Its consistent performance and robust stability make it an indispensable tool for ensuring the reliability of complex analytical setups, fostering confidence in reported data, and accelerating scientific discovery. Trust this eqipped standard for superior analytical performance and robust data acquisition in your critical lab operations.
FAQs
1. What are the primary applications for this Silicon standard?
This Silicon standard is primarily used for calibration and quality control in Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES) and Inductively Coupled Plasma-Mass Spectrometry (ICP-MS) for precise trace element analysis.
2. How should this standard solution be stored to maintain its integrity?
It should be stored tightly capped in its original container, away from direct sunlight and extreme temperatures, preferably between 15-30°C to ensure stability and prevent contamination.
3. Is this Silicon standard compatible with all ICP instruments?
Yes, this standard is formulated for broad compatibility with most commercially available ICP-OES and ICP-MS systems, provided appropriate instrument parameters and sample introduction systems are used.
4. What is the purity level of the Silicon in this standard?
The Silicon in this standard is of high purity, specifically designed for analytical applications requiring certified concentrations and minimal impurities to ensure accurate and reliable results.
5. Can this solution be used for purposes other than ICP analysis?
While primarily intended for ICP analysis, it can also be used as a general analytical reference standard for other techniques where a precisely known concentration of Silicon in a nitric acid matrix is required, always considering matrix compatibility.
