Tetramethylammonium hydroxide, 25% in water | 420520010 | Thermofisher

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Tetramethylammonium hydroxide, 25% in water | 420520010 | Thermofisher

25% aqueous tetramethylammonium hydroxide solution, reagent grade. Strong organic base used in synthesis, photoresist development, and analytical chemistry.

Price range: ₹5,755.00 through ₹29,400.00

Description

Specifications Table

Product Name – Tetramethylammonium hydroxide, 25% in water
Quantity/Pack Size – 1KG, 100GR
Form – Liquid (aqueous solution)
Grade – Reagent
Application – Organic synthesis, photoresist developer, analytical reagent

Product Overview

Tetramethylammonium hydroxide (TMAH), supplied as a 25% aqueous solution, is a quaternary ammonium compound widely recognized for its strong basic properties and solubility in polar solvents. This reagent-grade solution offers high purity with minimal impurities, making it suitable for critical laboratory applications where consistency and reliability are essential. The 25% concentration provides an optimal balance between reactivity and ease of handling, reducing the need for further dilution in most protocols. As a non-nucleophilic base, TMAH is particularly valuable in organic synthesis for deprotonation reactions without competing nucleophilic side reactions. Its stability in aqueous form ensures long shelf life when stored properly, though it remains hygroscopic and should be kept tightly sealed. The solution appears as a clear, colorless liquid with a mild amine-like odor, and its alkaline nature (pH typically >13) necessitates proper handling with standard laboratory safety measures. Compatible with most glass and plastic labware, though prolonged contact with certain metals should be avoided. This TMAH solution meets rigorous quality standards for research applications, with batch-to-batch consistency verified through strict quality control procedures.

FAQs

1. What is the exact concentration of this TMAH solution?

The solution contains 25% tetramethylammonium hydroxide by weight in deionized water, equivalent to approximately 2.7M concentration.

2. Can this TMAH solution be used for photoresist development?

Yes, the 25% concentration is commonly employed as a developer in photolithography processes, particularly for positive photoresists.

3. What materials are incompatible with this solution?

Avoid contact with strong oxidizing agents, aluminum, zinc, and copper alloys as violent reactions may occur.

4. How should this solution be stored for maximum stability?

Store in a tightly sealed original container at room temperature, protected from moisture and direct sunlight. Keep away from carbon dioxide sources.

5. What safety precautions are recommended when handling this solution?

Use in a well-ventilated area with proper PPE including gloves, goggles, and lab coat. Neutralize spills with dilute acid before cleanup.

Additional information

Size

1KG, 100GR

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