Description
Specifications Table
Product Name – TMAH, 25% Finyte®
Quantity/Pack Size – 8.5 lb
Form – Liquid
Grade – Electronic Grade
Application – Semiconductor etching, photoresist development, analytical chemistry
Product Overview
TMAH (Tetramethylammonium Hydroxide), 25% Finyte® is a high-purity, aqueous solution designed for critical laboratory and industrial applications. This electronic-grade chemical is widely recognized for its stability, low metal ion content, and consistent performance in precision processes. The 25% concentration ensures optimal reactivity while maintaining safety and ease of handling, making it ideal for semiconductor fabrication, photoresist development, and other sensitive applications where contamination control is paramount. The Finyte® formulation guarantees minimal particulate and ionic impurities, ensuring reliable results in microelectronics, analytical chemistry, and advanced materials research. Its balanced pH and controlled alkalinity make it a preferred choice for anisotropic etching of silicon wafers, where uniformity and reproducibility are essential. The solution is compatible with most lab-grade glassware and high-performance polymers, reducing the risk of cross-contamination. Whether used in research labs, quality control, or production environments, this TMAH solution delivers consistent performance, minimizing variability in experimental outcomes. The 8.5 lb packaging provides a practical volume for frequent use while ensuring long-term stability when stored under recommended conditions.
FAQs
1. What is the shelf life of TMAH, 25% Finyte® when stored properly?
The shelf life is typically 12–24 months from the date of manufacture when stored in a tightly sealed container at room temperature, away from direct sunlight and moisture. Always check the label for the exact expiration date.
2. Is this TMAH solution compatible with standard borosilicate glassware?
Yes, it is compatible with borosilicate glass and most high-density polyethylene (HDPE) or polypropylene (PP) containers. Avoid prolonged contact with metals or reactive plastics to prevent degradation.
3. Can this be used as a substitute for KOH in silicon etching applications?
Yes, TMAH is often preferred over KOH for silicon etching due to its lower toxicity, better etch selectivity, and reduced risk of potassium contamination in semiconductor processes.
4. What precautions should be taken while handling this solution?
Wear nitrile gloves, safety goggles, and a lab coat. Work in a well-ventilated area or under a fume hood, as TMAH is corrosive and can cause skin or eye irritation upon contact.
5. Does this solution require any special disposal procedures?
Yes, TMAH should be neutralized with a weak acid (e.g., acetic or hydrochloric acid) before disposal. Follow local hazardous waste regulations for proper disposal of neutralized solutions.
